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目前显示的是标签为“megasonic wafer cleaning”的博文

Siansonic Cover Type Megasonic Unit

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  Megasonic ultrasonic cleaner uses higher frequency ultrasonic energy in mega hertz scale to boost removal of submicron particles from substrates and chemical reactions. Compared to low frequency ultrasonic cavitations, megasonic cavitations effect can give smaller particles removal as well as less damage on the substrates.   Batch type megasonic transducer uses large megasonic transducer which can emit sound field with large area, then it can provide high cleaning efficiency. However, the distribution of sound field in the tank is not uniform. The intensity which is further way from the megasonic transducer is usually lower. And the transfer efficiency of sound power is low. Shower type megasonic wafer cleaning  can directly focus the megasonic energy onto the substrate surface, consequently the sound field can distribute uniformly on the substrate surface by moving the substrate and megasonic nozzle. However, the flow rate of cleaning fluid required by shower type mega...